With extensive experience in etching materials such as GaN, SiC, and Sapphire, our technologies provide the cost of ownership and production yield needed to maximize the performance of your devices.

The Oxford PlasmaPro 100 Polaris single wafer etch system offers intelligent solutions to deliver excellent etching results needed to maintain your competitive edge.

• Excellent etch rates
• Low cost of ownership
• Specifically designed for harsh chemistries
• Superior etch uniformity
• Special electrostatic clamp technology capable of clamping sapphire
• GaN on sapphire and silicon
• High-conductivity pumping system
• Clusterable with other PlasmaPro systems