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Oxford PlasmaPro100 PECVD

Oxford PlasmaPro100 PECVD

Oxford PlasmaPro100 PECVD

Category: OXFORD PECVD

Oxford PECVD process modules are specifically designed to produce films with excellent uniformity and high aspect ratios, while controlling film properties such as refractive index, stress, electrical characteristics, and wet etch rate.

  • High-quality films, high efficiency, excellent uniformity
  • Wide temperature range electrode
  • Compatible with all wafer sizes up to 200 mm
  • Quick changeover between wafer sizes
  • Low cost of ownership and ease of service
  • Resilient heated electrodes with capability up to 400°C or 1200°C
  • In-situ chamber cleaning

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