The Chemical Vapor Deposition (CVD) and PECVD systems developed for the growth of 1D/2D nanomaterials and heterostructures. The Oxford PlasmaPro 100 Nano (formerly Nanofab) allows high-performance growth of nanomaterials with flexible temperatures up to 1200°C, in-situ catalyst activation, and precise process control.

• Excellent uniformity with flexible temperatures up to 1200°C
• Available options for 700°C, 800°C, or 1200°C
• Sample sizes up to 200 mm
• Vacuum lock - Rapid sample change
• Showerhead design for uniform precursor dispersion
• Optional liquid/solid source delivery system for the growth of MoS2, MoSe2, and other TMDCs