The Oxford PlasmaPro ASP is designed to provide high-quality materials that can be rapidly deposited with the flexibility to run multiple chemistries, based on a production-proven platform for corporate/specialized R&D to deliver excellent layers for device integration. Our state-of-the-art Plasma Enhanced ALD system offers the speed for higher throughput and thicker films, while maintaining the flexibility, compatibility, and tunability of ALD.

• Three times faster than conventional remote plasma
• Reduced precursor consumption beneficial for environmental and operational costs
• High material quality
• Low cost of ownership
• Improved serviceability and maintenance
• Low volume chamber for speed
• Low surface damage
• Higher process stability